Deposition of NbN thin films by DC magnetron sputtering processKIM, S. K; CHA, B. C; YOO, J. S et al.Surface & coatings technology. 2004, Vol 177-78, pp 434-440, issn 0257-8972, 7 p.Conference Paper

Fundamental study and development of oscillating plasma glow discharge GC detectorsMAENG, D. Y; YOU, S. Y; CHA, B. C et al.Microchemical journal. 1997, Vol 55, Num 1, pp 88-98, issn 0026-265XArticle

The joint replenishment problem involving multiple suppliers offering quantity discountsMOON, I. K; GOYAL, S. K; CHA, B. C et al.International journal of systems science. 2008, Vol 39, Num 6, pp 629-637, issn 0020-7721, 9 p.Article

Hybrid genetic algorithm for group technology economic lot scheduling problemMOON, I. K; CHA, B. C; BAE, H. C et al.International journal of production research. 2006, Vol 44, Num 21, pp 4551-4568, issn 0020-7543, 18 p.Article

Analytical characteristics of organic compounds using an oscillating plasma glow discharge detector for gas chromatographyMAENG, D. Y; YOU, S. Y; CHA, B. C et al.Microchemical journal. 1997, Vol 55, Num 1, pp 99-109, issn 0026-265XArticle

The joint replenishment problem with resource restrictionMOON, I. K; CHA, B. C.European journal of operational research. 2006, Vol 173, Num 1, pp 190-198, issn 0377-2217, 9 p.Article

Deposition of CrN-MoS₂ thin films by D.C. magnetron sputteringKIM, S. K; CHA, B. C.Surface & coatings technology. 2004, Vol 188-89, pp 174-178, issn 0257-8972, 5 p.Conference Paper

Syntheses of pseudo-α-D-arabinofuranose, pseudo-β-D-arabinofuranose, and pseudo-β-L-xylofuranose, three optically active pseudo-pentofuranoses, from D-glucoseYOSHIKAWA, M; CHA, B. C; OKAICHI, Y et al.Chemical and pharmaceutical bulletin. 1988, Vol 36, Num 9, pp 3718-3721, issn 0009-2363Article

Syntheses of pseudo-α-D-glucopyranose and pseudo-β-L-idopyranose, two optically active pseudo-hexopyranoses, from D-glucose by using stereoselective reductive deacetoxylation with sodium borohydride and cyclitol formation from nitrofuranose as key reactionsYOSHIKAWA, M; CHA, B. C; NAKAE, T et al.Chemical and pharmaceutical bulletin. 1988, Vol 36, Num 9, pp 3714-3717, issn 0009-2363Article

Analysis of photomask CD errors depending on development methodsMOON, S.-Y; KI, W.-T; CHA, B.-C et al.SPIE proceedings series. 1999, pp 573-576, isbn 0-8194-3468-X, 2VolConference Paper

Evaluation of process capabilities for 50 keV with a rectangular shaped beam using computer simulationCHA, B.-C; KIM, Y.-H; CHOI, S.-W et al.SPIE proceedings series. 1998, pp 34-41, isbn 0-8194-2669-5Conference Paper

Evaluation of the practical use of GHOST technique for various e-beam resistsCHA, B.-C; KIM, J.-M; KIM, B.-G et al.SPIE proceedings series. 1998, pp 55-62, isbn 0-8194-3007-2Conference Paper

Three-dimensional electron-beam lithography simulator V2.0 for the gigabit era photomask manufacturingKIM, Y.-H; CHA, B.-C; LEE, H.-J et al.SPIE proceedings series. 1998, pp 358-365, isbn 0-8194-2669-5Conference Paper